SKIN1004
Madagascar Centella Hyalu-Cica Hydrating Mask 23ml
Madagascar Centella Hyalu-Cica Hydrating Mask 23ml
A soothing and deeply hydrating sheet mask infused with pure Centella Asiatica extract from Madagascar and a powerful Hyalu-Cica complex (Hyaluronic Acid + Centella). This mask calms irritated skin, restores moisture, and strengthens the skin barrier, leaving your complexion plump, refreshed, and radiant. Perfect for sensitive and dry skin needing an extra boost of hydration and care.
Key Benefits:
Provides intense hydration and moisture
Soothes and calms sensitive or irritated skin
Strengthens skin barrier
Leaves skin soft, plump, and radiant
Suitable for sensitive skin
How to Use:
After cleansing and toning, apply the mask to the face and leave on for 15–20 minutes. Remove the mask and gently pat remaining essence into the skin until fully absorbed. Use 2–3 times a week or as needed.
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성분
성분
Water (Aqua), Butylene Glycol, Glycerin, Niacinamide, 1,2-Hexanediol, Glyceryl Glucoside, Xylitylglucoside, Anhydroxylitol, Allantoin, Carbomer, Arginine, Xylitol, Centella Asiatica Extract (1,000 ppm), Polyglyceryl-10 Laurate, Ethylhexylglycerin, Xanthan Gum, Adenosine, Glucose, Disodium EDTA, Hydrogenated Lecithin, Musa Sapientum (Banana) Flower Extract, Rosa Damascena Flower Water, Pyrus Communis (Pear) Fruit Extract, Prunus Domestica (Plum) Fruit Extract, Squalane, Cucumis Melo (Melon) Fruit Extract, Hedera Helix (Ivy) Leaf/Stem Extract, Sodium Hyaluronate (3.5 ppm), Ceramide NP, Cetyl Ethylhexanoate, Cholesterol, Macadamia Ternifolia Seed Oil, Brassica Campestris (Rapeseed) Sterols, Oleic Acid, Stearic Acid, Tocopherol, Hyaluronic Acid (0.1 ppm), Hydrolyzed Hyaluronic Acid (0.1 ppm), Hydrolyzed Sodium Hyaluronate (0.1 ppm), Hydroxypropyltrimonium Hyaluronate (0.1 ppm), Potassium Hyaluronate (0.1 ppm), Sodium Hyaluronate Crosspolymer (0.1 ppm), Pentylene Glycol, Sodium Acetylated Hyaluronate (0.07 ppm).
공유
